Вышедшие номера
Photoluminescence study on defects in multicrystalline silicon
Arguirov T.1,2, Seifert W.1,2, Jia G.3,2, Kittler M.1,2
1IHP, Im Technologiepark 25,, Frankfurt (Oder), Germany
2IHP/BTU Joint Lab, Konrad Wachsmann Allee 1, Cottbus, Germany
3BTU Cottbus, Konrad Wachsmann Allee 1, Cottbus, Germany
Поступила в редакцию: 12 сентября 2006 г.
Выставление онлайн: 19 марта 2007 г.

We report on spatially resolved luminescence measurements on ribbon grown silicon samples. It is found, that the band-edge luminescence shows anomalous temperature behaviour, namely an increase of the radiation intensity with temperature. Phosphorous diffusion gettering is found to enhance this effect. The anomalous temperature behaviour is attributed to nonradiative recombination governed by shallow traps. A shift in the phonon replica of the band edge luminescence peak has been observed and associated with tensile stress. PACS: 78.55.Ap, 78.55.Qr