Silicon Light-Emitting Diodes with Dislocation-Related Luminescence Fabricated with Participation of Oxygen Precipitates
Sobolev N. A.1, Kalyadin A. E. 1, Shtel’makh K. F. 1, Aruev P. N. 1, Zabrodskiy V. V.1, Shek E. I.1
1Ioffe Institute, St. Petersburg, Russia
Email: nick@sobolev.ioffe.rssi.ru

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Silicon light-emitting diodes with dislocation-related electroluminescence have been studied at room temperature. For the fabrication of the light-emitting diode structures, a well-known method for the formation of dislocation-related luminescence centers during anneals of silicon with a high oxygen concentration in a flow of argon was modified by introducing a preliminary O+ ion implantation and carrying out a final anneal in a chlorine-containing atmosphere. In the electroluminescence spectra, the D1 dislocation-related luminescence line dominates at currents less than <150 mA and the near-band-edge luminescence line starts to dominate with increasing current. The electroluminescence excitation efficiency for the D1 center is 3.3·10-20 cm2·s at room temperature. Keywords:: Light-emitting diodes, dislocation-related luminescence, silicon, oxygen precipitates.
  1. N.A. Drozdov, A.A. Patrin, V.D. Tkachev. JETP Lett., 23, 597 (1976)
  2. N.A. Sobolev. Semiconductors, 44 (1), 1 (2010)
  3. Luelue Xiang, Dongsheng Li, Lu Jin, Shuming Wang, Deren Yang. J. Appl. Phys., 113, 033518 (2013)
  4. V.V. Kveder, E.A. Steinman, S.A. Shevchenko, H.G. Grimmeiss. Phys. Rev. B, 51, 10520 (1995)
  5. E.O. Sveinbjornsson, J. Weber. Appl. Phys. Lett., 69, 2686 (1996)
  6. V. Kveder, V. Badylevich, E. Steinman, A. Izotov, M. Zeibt, W. Schreter. Appl. Phys. Lett., 84, 2106 (2004)
  7. N.A. Sobolev, A.M. Emel'yanov, V.V. Zabrodskii, N.V. Zabrodskaya, V.L. Sukhanov, E.I. Shek. Semiconductors, 41, 616 (2007)
  8. H.A. Sobolev, A.E. Kalyadin, M.V. Konovalov, P.N. Aruev, V.V. Zabrodskiy, E.I. Shek, K.F. Shtel'makh, A.N. Mikhaylov, D.I. Tetel'baum. Semiconductors, 50 (2), 240 (2016)
  9. N.A. Sobolev, A.E. Kalyadin, E.I. Shek, K.F. Shtel'makh, A.K. Gutakovskii, V.I. Vdovin, A.N. Mikhaylov, D.I. Tetel'baum, D. Li, D. Yang, L.I. Fedina. Mater. Today Proc., 5-6, 14772 (2016)
  10. S. Binetti, S. Pizzini, E. Leoni, R. Somaschini, A. Castaldini, A. Cavallini. J. Appl. Phys., 92, 2437 (2002)
  11. S. Pizzini, E. Leonti, S. Binetti, M. Acciarri, A. Le Donne, B. Pichaud. Sol. St. Phenomena, 95-96, 273 (2004)
  12. K. Bothe, R.J. Falster, J.D. Murphy. Appl. Phys. Lett., 101, 032107 (2012)
  13. V.I. Vdovin, L.I. Fedina, A.K. Gutakovskii, A.E. Kalyadin, E.I. Shek, K.F. Shtel'makh, N.A. Sobolev. Crystallogr. Rep., 66 (4), 625 (2021)
  14. N.A. Sobolev, A.E. Kalyadin, K.F. Shtel'makh, E.I. Shek. Semiconductors, 55 (12), 891 (2021)
  15. M. Brehm, M. Grydlik. Nanotechnology, 28, 392001 (2017)
  16. V.A. Zinovyeva, A.F. Zinovieva, Zh.V. Smagina, A.V. Dvurechenskii, V.I. Vdovin, A.K. Gutakovskii, L.I. Fedina, O.M. Borodavchenko, V.D. Zhivulko, A.V. Mudryi. J. Appl. Phys., 130, 153101 (2021)
  17. J.F. Ziegler, M.D. Ziegler, J.P. Biersack. Nucl. Instr. Meth. B, 268, 1818 (2010)
  18. http://www.srim.org
  19. S.M. Sze. Physics of Semiconductor Devices (Wiley-Interscience, 1969)
  20. S. Coffa, G. Franzo, F. Priolo. Appl. Phys. Lett., 69, 2077 (1996)
  21. N.A. Sobolev. Physica B, 308-310, 333 (2001)
  22. N.A. Sobolev, A.M. Emel'yanov, R.N. Kyutt, Yu.A. Nikolaev. Sol. St. Phenomena, 69-70, 371 (1999)
  23. T. Trupke, M.A. Green, P. Wurfel, P.P. Altermatt, A. Wang, J. Zhao, R. Corkish. J. Appl. Phys., 94, 4930 (2003)

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