On sputter damage of silicon heterojunction solar cells and its recovery by illuminated annealing
Abolmasov S. N.1,2, Levitskii V. S.1,2, Titov A. S.1,2, Terukov E. I.1,2
1R and D Center of Thin Film Technologies in Energetics, St. Petersburg, Russia
2Ioffe Institute, St. Petersburg, Russia
Email: s.abolmasov@hevelsolar.com

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Mechanisms of plasma damage caused by sputtering of transparent conductive oxide (TCO) layers in silicon heterojunction (SHJ) solar cells have been investigated. It is shown that a buffer layer at the amorphous/crystalline silicon (a-Si/c-Si) interface can play an essential role in mitigating the sputter damage. More than 9 %abs. loss in the conversion efficiency is observed for rear emitter SHJ cells with nanocrystalline silicon n-layer when the underlying buffer layer changes from amorphous silicon carbide to amorphous silicon. It is revealed that the anomalous efficiency loss is mostly related to breaking Si-H bonds by NUV photons at the a-Si/c-Si interface during the TCO sputtering. Illuminated annealing of these cells at elevated temperature using a distributed light source based on light emitting diodes (LEDs) recovers the anomalous efficiency loss by more than 7 %abs. Other possible mechanisms of sputter damage and mitigation strategies are also discussed. Keywords: magnetron sputtering, transparent conductive oxide, a-Si/c-Si interface, surface passivation, conversion efficiency.
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