Вышедшие номера
Precursors for CVD growth of nanocrystalline diamond
Soga T.1, Sharda T.2, Jimbo T.1
1Department of Environmental Technology and Urban Planning, Nagoya Institute of Technology, Nagoya 46, Japan
2Research and Development, Seki Technotron Corp., Tokyo 13, Japan
Email: soga@elcom.nitech.ac.jp
Выставление онлайн: 19 марта 2004 г.

Variuos routes to grow nanocrystalline diamond films by chemical vapor deposition technique are reviewed. Among various routes, NCD films deposited on mirror polished silicon substrates by biased enhanced growth by microwave plasma chemical vapor deposition are described in detail. Qualitative concentration of NCD was assessed by Raman spectroscopy and X-ray diffraction patterns of the films. The hardness of the films approaches to that of natural diamond at optimized conditions while still having low amount of stress (<1 GPa).
  1. D.G. Bhat, D.G. Johnson, A.P. Malshe, H. Naseem, W.D. Brown, L.W. Schaper, C.-H. Shen. Diamond Relat. Mater. 4, 921 (1995)
  2. A.K. Gangopadhyay, M.A. Tamor. Wear 169, 221 (1993)
  3. B. Bhusan. Diamond Relat. Mater. 8, 1985 (1999)
  4. A. Erdemir, G.R. Fenske, A.R. Krauss, D.M. Gruen, T. McCauley, R.T. Csencsits. Surf. Coat. Technol. 120--121, 565 (1999)
  5. S.K. Choi, D.Y. Yung, S.Y. Kweon, S.K. Jung. Thin Solid Films 279, 110 (1996)
  6. S. Hogmark, O. Hollman, A. Alahelisten, O. Hedenqvist. Wear 200, 225 (1996).
  7. D. Zhou, T.G. McCauley, L.C. Qin, A.R. Krauss, D.M. Gruen. J. Appl. Phys. 83, 540 (1998)
  8. T. Sharda, S. Bhattacharyya. In: Encyclopedia of Nanoscience and Nanotechnology / Ed. H.S. Nalwa. American Scientific Publ., California, USA (2003)
  9. L.S. Pan, D.R. Kania. Diamond: Electronic Properties and Application. Luwer Academ. Publ., London (1995)
  10. W. Banholzer. Surf. Coat. Technol. 53, 1 (1992)
  11. D.M. Gruen. Ann. Rev. Mater. Sci. 29, 211 (1999)
  12. D.M. Gruen, X. Pan, A.R. Krauss, S. Liu, J. Luo, C.M. Foster. J. Vac. Sci. Technol. A 12, 1491 (1994)
  13. T. Lin, Y. Yu, T.S. Wee, Z.X. Shen, K.P. Loh. Appl. Phys. Lett. 77, 2692 (2000)
  14. K. Wu, E.G. Wang, J. Chen, N.S. Xu. J. Vac. Sci. Technol. B 17, 1059 (1999)
  15. K. Wu, E.G. Wang, Z.X. Cao, Z.L. Wang, X. Jiang. J. Appl. Phys. 88, 2967 (2000)
  16. J. Lee, B. Hong, R. Messier, R.W. Collins. Appl. Phys. Lett. 69, 1716 (1996)
  17. J. Lee, R.W. Collins, R. Messier, Y.E. Strausser. Appl. Phys. Lett. 70, 1527 (1997)
  18. K. Teii, H. Ito, M. Hori, T. Takeo, T. Goto. J. Appl. Phys. 87, 4572 (2000)
  19. S. Yugo, T. Kanai, T. Kimura, T. Muto. Appl. Phys. Lett. 58, 1036 (1991)
  20. S.T. Lee, H.Y. Peng, X.T. Zhou, N. Wang, C.S. Lee, I. Bello, Y. Lifshits. Science 287, 104 (2000)
  21. T. Sharda, T. Soga, T. Jimbo, M. Umeno. Diamond Relat. Mater. 9, 1331 (2000)
  22. T. Sharda, M. Umeno, T. Soga, T. Jimbo. Appl. Phys. Lett. 77, 4304 (2000)
  23. T. Sharda, T. Soga, T. Jimbo, M. Umeno. Diamond Relat. Mater. 10, 1592 (2001)
  24. W.B. Yang, F.X. Lu, Z.X. Cao. J. Appl. Phys. 91, 10 068 (2002)
  25. W. Zhu, G.P. Kochanski, S. Jin. Science 282, 1471 (1998)
  26. A. Gohl, A.N. Alimova, T. Habermann, A.L. Mescheryakova, D. Nau, G. Muller. J. Vac. Sci. Technol. B 17, 670 (1999)
  27. N.S. Xu, J. Chen, Y.T. Feng, M.J. McNallan. Nature 411, 283 (2001)
  28. E. Maillard-Schaller, O.M. Kuettel, L. Diederich, L. Schlapbach, V.V. Zhirnov, P.I. Belobrov. Diamond Relat. Mater. 8, 805 (1999)
  29. A. Hiraki. Appl. Surf. Sci. 162--163, 326 (2000)
  30. J. Robertson et al. Appl. Phys. Lett. 66, 3287 (1995)
  31. X. Jiang, C.-P. Klages, R. Zachai, M. Hartweg, H.-J. Fusser. Appl. Phys. Lett. 62, 3438 (1993)
  32. T. Sharda, T. Soga. To be published
  33. A.C. Ferrari, J. Robertson. Phys. Rev. B 61, 14 095 (2000)
  34. R.J. Nemanich, J.T. Glass, G. Lucovsky, R.E. Shorder. J. Vac. Sci. Technol. A 6, 1783 (1988)
  35. L.C. Nistor, J.V. Landuyt, V.G. Ralchenko, E.D. Obraztsova, A.A. Smolin. Diamond Relat. Mater. 6, 159 (1997)
  36. T. Sharda, M. Umeno, T. Soga, T. Jimbo. J. Appl. Phys. 89, 4874 (2001)
  37. F.C. Marques, R.G. Lacerda, G.Y. Odo, C.M. Lepienski. Thin Solid Films 332, 113 (1998)
  38. R.G. Lacerda, F.C. Marques. Appl. Phys. Lett. 73, 617 (1998)
  39. D.R. Mckenzie, D.A. Muller, B.A. Paithorpe. Phys. Rev. Lett. 67, 773 (1991)
  40. S. Sattel, J. Robertson, M. Scheib, H. Ehrhardt. Appl. Phys. Lett. 69, 497 (1996)
  41. S. Logothetidis, M. Gioti, P. Patsalas, C. Charitidis. Carbon 37, 765 (1999).

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