Technical Physics Letters
Volumes and Issues
Analysis of (Al)GaAs/Si buffer structures using photoluminescence measurements
Slipchenko S. O.1, Shamakhov V. V.1, Nikolaev D. N.1, Fomin E. V.1, Kondratov M. I.1, Pikhtin N. A.1
1Ioffe Institute, St. Petersburg, Russia
Email: serghpl@mail.ioffe.ru, Shamakhov@mail.ioffe.ru, Dim@mail.ioffe.ru, Evfomin@mail.ioffe.ru, Mikondratov@mail.ioffe.ru, Nike@hpld.ioffe.ru

PDF
AlGaAs photoluminescent structures were grown on a Si substrate by metal-organic chemical vapor deposition. It was shown that the incorporation of bulk (Al)GaAs layers and AlGaAs/GaAs superlattices into the GaAs buffer layer degrades the root-mean-square surface roughness and photoluminescence intensity compared to a GaAs buffer without such inserts. An assessment of the residual strains in the structure was also performed based on photoluminescence data. It was shown that the use of AlGaAs inserts in the GaAs buffer layer increases the residual strains in the structure. Keywords: MOCVD, buffer layers, silicon substrate, photoluminescence, residual strain.
  1. J. Yang, Z. Liu, P. Jurczak, M. Tang, K. Li, S. Pan, A. Sanchez, R. Beanland, J.-C. Zhang, H. Wang, J. Phys. D, 54 (3), 035103 (2020). DOI: 10.1088/1361-6463/abbb49
  2. M. Tang, S. Chen, J. Wu, Q. Jiang, V.G. Dorogan, M. Benamara, Y.I. Mazur, G.J. Salamo, A. Seeds, H. Liu, Opt. Express, 22 (10), 11528 (2014). DOI: 10.1364/OE.22.011528
  3. M.O. Petrushkov, D.S. Abramkin, E.A. Emelyanov, M.A. Putyato, O.S. Komkov, D.D. Firsov, A.V. Vasev, M.Y. Yesin, A.K. Bakarov, I.D. Loshkarev, A.K. Gutakovskii, V.V. Atuchin, V.V. Preobrazhenskii, Nanomaterials, 12 (24), 4449 (2022). DOI: 10.3390/nano12244449
  4. H. Kim, D.-M. Geum, Y.-H. Ko, W.-S. Han, Nanoscale Res. Lett., 17, 126 (2022). DOI: 10.1186/s11671-022-03762-9
  5. S.O. Slipchenko, V.V. Shamakhov, M.I. Kondratov, E.V. Fomin,D.N. Nikolaev, A.V. Myasoedov, N.A. Bert, N.A. Pikhtin, Pisma v ZhTF, 52 (7), 48 (2026) (in Russian). DOI: 10.61011/PJTF.2026.07.62523.20553
  6. H. Jifang, S. Xiangjun, L. Mifeng, Z. Yan, C. Xiuying, N. Haiqiao, X. Yingqiang, N. Zhichuan, J. Semicond., 32 (4), 043004 (2011). DOI: 10.1088/1674-4926/32/4/043004
  7. Y.-L. Tsai, H.-H. Yang, J.-H. Fang, C.-L. Chang, M.-H. Chen, C.-H. Wu, H.-F. Hong, Thin Solid Films, 733, 138817 (2021). DOI: 10.1016/j.tsf.2021.138817
  8. G. Landa, R. Carles, C. Fontaine, E. Bedel, A. Munoz-Yague, J. Appl. Phys., 66 (1), 196 (1989). DOI: 10.1063/1.343904
  9. C.G. Van de Walle, Phys. Rev. B, 39 (3), 1871 (1989). DOI: 10.1103/PhysRevB.39.1871
  10. M.P.C.M. Krijn, Semicond. Sci. Technol., 6 (1), 27 (1991). DOI: 10.1088/0268-1242/6/1/005

Подсчитывается количество просмотров абстрактов ("html" на диаграммах) и полных версий статей ("pdf"). Просмотры с одинаковых IP-адресов засчитываются, если происходят с интервалом не менее 2-х часов.

Дата начала обработки статистических данных - 27 января 2016 г.

Publisher:

Ioffe Institute

Institute Officers:

Director: Sergei V. Ivanov

Contact us:

26 Polytekhnicheskaya, Saint Petersburg 194021, Russian Federation
Fax: +7 (812) 297 1017
Phone: +7 (812) 297 2245
E-mail: post@mail.ioffe.ru