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Development of a laser-plasma spark targets echelon for an EUV nanolithography light source
Chernoiziumskaya T.V.
1, Sergeev V.Y.
1, Kontorin V.V.1, Beliaevskii D.E.2, Buts M.K.
1, Kapralov V.G.
1, Karaseov P. A.
1, Korobko D.D.
1, Tsaregorodtsev M.A.1, Sharov I.A.
1
1Peter the Great Saint-Petersburg Polytechnic University, St. Petersburg, Russia
2 LLC TechnosystemTrade, Saint Petersburg, Russia
2 LLC TechnosystemTrade, Saint Petersburg, Russia
Email: t.chernoizyumskaya@spbstu.ru, V.Sergeev@spbstu.ru, vitaly.kontorin@mail.ru, belyaevskij@yandex.ru, misha.bucz@mail.ru, kapralov15@mail.ru, platon.karaseov@spbstu.ru, korobko.dd@spbstu.ru, caregorodcev.spbstu@mail.ru, I.Sharov@spbstu.ru
The test-bed setup for producing echelon of laser-plasma spark targets for an EUV nanolithography light source was designed and commissioned. The development of Plateau-Rayleigh instability in a liquid argon jet has been experimentally observed and recorded using high-speed video. Targets in the echelon have average diameter of 0.2 mm and a spatial period of 0.5 mm. These parameters are promising to be utilized in a EUV light source for nanolithography. Keywords: target, echelon, EUVL, laser-plasma spark, nanolithography, xenon, argon.
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