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Optical properties of a thin nickel film exposed to high-intensity terahertz pulses
Chefonov O. V.1, Evlashin S. A.2, Ovchinnikova M. A. 1, Il’ina I. V. 1, Ovchinnikov A. V.1
1Joint Institute for High Temperatures, Russian Academy of Sciences, Moscow, Russia
2Skolkovo Institute of Science and Technology, Moscow, Russia
Email: ovtch2006@yandex.ru

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The paper presents the results of experimental studies of the complex refractive index of a thin nickel film exposed to subpicosecond terahertz pulses with the electric field strength of 0.5-10 MV/cm. A 20 nm thick nickel film deposited on a 160 μm thick glass substrate was used in the experiments. The studies were conducted in the spectral range of 0.25-2.25 THz. Keywords: terahertz radiation, thin nickel film, complex refractive index, optical constants.
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