The texture of thin films of aluminum nitride obtained by magnetron sputtering
Strunin V. I. 1,2, Baranova L. V. 1,2, Baisova B. T. 1,2
1Dostoevsky Omsk State University, Omsk, Russia
2Institute of Radiophysics and Physical Electronics of OSC SB RAS, Omsk, Russia
Email: baranova@omsu.ru
The results of studying the texture of thin aluminum nitride films obtained by magnetron sputtering are presented. The dependence of the crystallite size and degree of preferential orientation on the conditions of the thin films formation (pressure, discharge power, composition of the plasma-forming gas) is considered. Keywords: aluminum nitride films, magnetron sputtering, texture, size of the coherent scattering region.
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