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Effect of an intermediate layer on the formation and properties of nanostructured ITO films
Russian version
Markov L. K. 1, Smirnova I. P. 1, Pavluchenko A. S. 1, Yagovkina M. A. 1, Nashchekin A. V. 1
1Ioffe Institute, St. Petersburg, Russia
Email: l.markov@mail.ioffe.ru, irina@quantum.ioffe.ru, a.s.pavluchenko@mail.ioffe.ru, ymasha@mail.ioffe.ru, Nashchekin@mail.ioffe.ru
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The process of growing nanostructured films by magnetron sputtering on glass substrates with and without pre-deposited dense indium-tin oxide (ITO) layers has been studied. It has been shown that the intermediate ITO layer helps the nucleation of nanowires at low temperatures at the initial stages of film growth. Optical measurements have demonstrated antireflection ability of the nanocrystal layer. Taking into account the reduced surface resistance of the obtained films, the proposed method is promising for a wide range of applications, including manufacturing transparent electrodes for optoelectronic devices. Keywords: transparent conductive oxides, indium tin oxide, ITO, nanostructured coatings.
  1. T. Chaikeeree, N. Mungkung, N. Kasayapanand, H. Nakajima, T. Lertvanithphol, K. Tantiwanichapan, A. Sathukarn, M. Horprathum, Opt. Mater., 129, 112439 (2022). DOI: 10.1016/J.OPTMAT.2022.112439
  2. X. Zheng, X. Qiao, F. Luo, B. Wan, C. Zhang, Sens. Actuators B, 346, 130440 (2021). DOI: 10.1016/J.SNB.2021.130440
  3. J. Suo, K.X. Jiao, J.H. Yi, D. Fang, O. Ruzimuradov, J. Cent. South Univ., 31 (3), 747 (2024). DOI: 10.1007/s11771-024-5590-y
  4. Y. Ding, Y. Lin, Y. Zhang, H. Jiang, M. Su, E. Xie, Z. Zhang, Appl. Phys. Lett., 125 (6), 063902 (2024). DOI: 10.1063/5.0220141
  5. J. Suo, K. Jiao, D. Fang, H. Bu, Y. Liu, F. Li, O. Ruzimuradov, Vacuum, 204, 111338 (2022). DOI: 10.1016/J.VACUUM.2022.111338
  6. L. Filatov, V. Chernyavsky, I. Ezhov, L. Markov, A. Pavluchenko, I. Smirnova, P. Vishniakov, N. Yurchenko, P. Zhukov, M. Maximov, Mater. Today Commun., 44, 112116 (2025). DOI: 10.1016/J.MTCOMM.2025.112116
  7. A.S. Pavluchenko, L.K. Markov, I.P. Smirnova, V.V. Aksenova, M.V. Mesh, D.S. Kolokolov, Mater. Lett., 372, 137040 (2024). DOI: 10.1016/J.MATLET.2024.137040
  8. Z. An, Y. Shen, X. Xu, F. Shi, F. Song, Y. Yu, J. Dong, Y. Xu, L. Zhang, J. Zhao, J. Nanopart. Res., 26 (6), 132 (2024). DOI: 10.1007/s11051-024-06044-w
  9. G. Meng, T. Yanagida, K. Nagashima, H. Yoshida, M. Kanai, A. Klamchuen, F. Zhuge, Y. He, S. Rahong, X. Fang, S. Takeda, T. Kawai, J. Am. Chem. Soc., 135 (18), 7033 (2013). DOI: 10.1021/ja401926u
  10. C. O'Dwyer, M. Szachowicz, G. Visimberga, V. Lavayen, S.B. Newcomb, C.M.S. Torres, Nat. Nanotechnol., 4 (4), 239 (2009). DOI: 10.1038/nnano.2008.418
  11. S.M. Yang, H.K. Yen, K.C. Lu, Nanomaterials, 12 (6), 897 (2022). DOI: 10.3390/nano12060897
  12. Y. Shen, Y. Zhao, J. Shen, X. Xu, JOM, 69 (7), 1155 (2017). DOI: 10.1007/s11837-017-2353-3
  13. Y. Zhang, Q. Li, Z. Tian, P. Hu, X. Qin, F. Yun, SN Appl. Sci., 2 (2), 264 (2020). DOI: 10.1007/s42452-020-2050-7
  14. L.K. Markov, A.S. Pavluchenko, I.P. Smirnova, V.V. Aksenova, M.A. Yagovkina, V.A. Klinkov, Thin Solid Films, 774, 139848 (2023). DOI: 10.1016/J.TSF.2023.139848
  15. H.K. Yu, J.L. Lee, Sci. Rep., 4 (1), 6589 (2014). DOI: 10.1038/srep06589
  16. H.K. Yu, W.J. Dong, G.H. Jung, J.L. Lee, ACS Nano, 5 (10), 8026 (2011). DOI: 10.1021/nn2025836

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