Photodetectors with the long-wavelength cutoff of 2.4 μm based on metamorphic InGaAs/InP heterostructures grown by metal-organic vapor-phase epitaxy
Kalyuzhnyy N.A.
1, Kizhaev S.S.2, Mintairov S.A.1, Pivovarova A.A.1, Salii R.A.1, Chernjaev A.B.2,3
1Ioffe Institute, St. Petersburg, Russia
2Microsensor Technology, LLC, Saint-Petersburg, Russia
3Budyonny Military Academy of the Signal Corps, St. Petersburg, Russia
Email: Nickk@mail.ioffe.ru
The technique for growing metamorphic InGaAs buffer layers on InP substrates was used to create photodetectors with the long-wavelength cutoff of 2.4 μm. Optical and electrical characteristics of photodetectors based on the InGaAs/InP metamorphic heterostructure and those of devices based on the GaInAsSb/GaSb isoperiodic system were compared. Instrumental applicability of the developed technique is confirmed by high reverse-bias photosensitivity and resistance of the photodetectors. The dark current values correlate with low density of threading dislocations in the photodetector active region assessed by transmission electron microscopy. Keywords: photodetector, InGaAs/InP, metal-organic vapor-phase epitaxy, metamorphic layer, heterostructure.
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