Yurjev Y. N.1, Yurjeva A. V.1, Saveljev A. I.1, Vorobiev M. S.2, Moskvin P. V.2
1Tomsk Polytechnic University, Tomsk, Russia
2Institute of High Current Electronics, Siberian Branch, Russian Academy of Sciences, Tomsk, Russia
Email: yurjev@tpu.ru
The possibility of processing Nb-Sn films, which were deposited by magnetron sputtering, with a pulsed electron beam was investigated. Irradiation of coatings leads to the formation of the Nb3Sn phase. The films were irradiated with different beam energy densities and pulse durations. The surface morphology and phase composition of irradiated films were studied. Keywords: Magnetron sputtering, Nb3Sn films, electron beam, plasma cathode, electron beam processing
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