Simulation of reactive high-power impulse magnetron sputtering process of a metal (vanadium) target
Kudryavtseva D. A.1, Komlev A. E.1, Altynnikov A. G.1, Platonov R. A.1, Karzin V. V.1, Tsymbalyuk A. A.1
1St. Petersburg State Electrotechnical University “LETI", St. Petersburg, Russia
Email: dakudryavtseva@stud.etu.ru

PDF
This paper presents a physicochemical model describing the process of high-power impulse reactive magnetron sputtering of a metal target. An increase in the pulse power density of the power source contributes to the heating of the target, which leads to an increase in the efficiency of spraying and the appearance of a flow of vaporized matter. The combination of these effects leads to an increase in the deposition rate of films of complex compounds. The presented paper presents the results of simulation of the sputtering process of a vanadium target in an Ar + O2 medium, which demonstrated an increase in the sputtering rate by 8.5 times with an increase in power density from 0.5 kW/cm2 to 1.5 kW/cm2. Keywords: reactive magnetron sputtering, HiPIMS, nonisotermal model, vanadium dioxide.
  1. G. Greczynski, L. Hultman, Vacuum, 124, 1 (2016). DOI: 10.1016/j.vacuum.2015.11.004
  2. H. Zhang, J.S. Cherng, Q. Chen, AIP Adv., 9 (3), 035242 (2019). DOI: 10.1063/1.5084031
  3. J. Vlvcek, D. Kolenaty, J. Houvska, T. Kozak, R. vCerstvy, J. Phys. D: Appl. Phys., 50 (38), 38LT01 (2017). DOI: 10.1088/1361-6463/aa8356
  4. A.A. Barybin, V.I. Shapovalov, J. Appl. Phys., 101 (5), 054905 (2007). DOI: 10.1063/1.2435795
  5. V.V. Karzin, A.E. Komlev, K.I. Karapets, N.K. Lebedev, Surf. Coat. Technol., 334, 269 (2018). DOI: 10.1016/j.surfcoat.2017.11.049
  6. V.I. Shapovalov, V.V. Karzin, A.S. Bondarenko, Phys. Lett. A, 381 (5), 472 (2017). DOI: 10.1016/j.physleta.2016.11.028
  7. S. Dushman, Scientific foundations of vacuum technique (John Wiley and Sons, Inc, N.Y.-London, 1962), p. 745. DOI: 10.1021/ed039pA606
  8. K.E. Frantseva, G.A. Semenov, TVT, 7 (1), 55 (1969)
  9. J. Holzl, F. Schulte, in Solid surface physics. Springer Tracts in Modern Physics (Springer, Berlin-Heidelberg, 1979), vol. 85, p. 1-150. DOI: 10.1007/BFb0048919
  10. C. Ko, Z. Yang, S. Ramanathan, ACS Appl. Mater. Interfaces, 3 (9), 3396 (2011). DOI: 10.1021/am2006299
  11. J.A. Theil, E. Kusano, A. Rockett, Thin Solid Films, 298 (1-2), 122 (1997). DOI: 10.1016/S0040-6090(96)09147-X

Подсчитывается количество просмотров абстрактов ("html" на диаграммах) и полных версий статей ("pdf"). Просмотры с одинаковых IP-адресов засчитываются, если происходят с интервалом не менее 2-х часов.

Дата начала обработки статистических данных - 27 января 2016 г.

Publisher:

Ioffe Institute

Institute Officers:

Director: Sergei V. Ivanov

Contact us:

26 Polytekhnicheskaya, Saint Petersburg 194021, Russian Federation
Fax: +7 (812) 297 1017
Phone: +7 (812) 297 2245
E-mail: post@mail.ioffe.ru