Technical Physics Letters
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Formation of (100) texture in thin Ti films under low-energy ion bombardment
Selyukov R. V.1, Izyumov M. O.1, Naumov V. V.
1, Mazaletskiy L. A.
2
1Valiev Institute of Physics and Technology of RAS, Yaroslavl Branch, Yaroslavl, Russia
2Demidov State University, Yaroslavl, Russia
2Demidov State University, Yaroslavl, Russia
Email: mikhail-izyumov@yandex.ru, vvnau@rambler.ru, rvselyukov@mail.ru
10-40 nm Ti films with mixed crystalline texture (100)+(001) are exposed to ion bombardment in inductively coupled Ar plasma by applying the bias -30 V to the films. It is found that such a treatment leads to the formation of (100) texture in films. This result is explained by the generation of the compressive stress in films as a result of ion bombardment. The thinner the film the less time is required to form the (100) texture. Keywords: crystalline texture, ion bombardment, titanium, thin films.
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