Study of Ga_2O3 deposition by MOVPE from trimethylgallium and oxygen in a wide temperature range
Lundin W.V. 1, Rodin S.N.1, Sakharov A.V. 1, Tsatsulnikov A.F. 2, Lobanova A.V.3, Bogdanov M.V.3, Talalaev R.A.3, Haiding Sun4, Shibing Long4
1Ioffe Institute, St. Petersburg, Russia
2Submicron Heterostructures for Microelectronics, Research & Engineering Center, RAS, Saint-Petersburg, Russia
3Soft-Impact Ltd, Saint-Petersburg, Russia
4School of Microelectronics, University of Science and Technology of China, Hefei, China
Email: lundin.vpegroup@mail.ioffe.ru

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Study of Ga2O3 deposition by MOVPE using trimethylgallium and oxygen was performed in a wide temperature range. It was found that for Ga2O3 deposition rate vs temperature dependence is very close to the TMGa pyrolysis in nitrogen. Kinetically-limited range for these processes corresponds to 550-700oC, that is 150oC higher, then for GaN deposition in the same reactor. Keywords: gallium oxide, MOVPE
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