Technical Physics Letters
Volumes and Issues
Influence of heterostructure radius increment on the heterointerface of IIIVxV1-x nanowires
Leshchenko E. D.1, Dubrovskii V. G.2
1Submicron Heterostructures for Microelectronics, Research & Engineering Center, RAS, Saint-Petersburg, Russia
2St. Petersburg State University, St. Petersburg, Russia
Email: leshchenko.spb@gmail.com

PDF
The formation of axial heterostructures in IIIVxV1-x nanowires is studied theoretically. We consider the case when the nanowire radius changes during the growth. It is shown that an increase in the radius has almost no effect on the heterointerface of thin nanowires. The effect becomes noticeable at a high rate of radial growth or for thick nanostructures. It is shown that the radius increment during growth leads to the formation of a sharper heterojunction, which is especially pronounced in nanostructures with a large radius. Keywords: modelling, nanowires, III-V-V heterostructures, interfacial profile.
  1. K. Hiruma, H. Murakoshi, M. Yazawa, T. Katsuyama, J. Cryst. Growth, 163, 226 (1996). DOI: 10.1016/0022-0248(95)00714-8
  2. H.A. Nilsson, P. Caroff, E. Lind, M.-E. Pistol, C. Thelander, L.-E. Wernersson, J. Appl. Phys., 110, 064510 (2011). DOI: 10.1063/1.3633742
  3. M. Spies, E. Monroy, Semicond. Sci. Technol., 34, 053002 (2019). DOI: 10.1088/1361-6641/ab0cb8
  4. R. Ha, S.-W. Kim, H.-J. Choi, Nanoscale Res. Lett., 8, 299 (2013). DOI: 10.1186/1556-276X-8-299
  5. D. Ren, L. Ahtapodov, J.S. Nilsen, J. Yang, A. Gustafsson, J. Huh, G.J. Conibeer, A.T.J. van Helvoort, B.O. Fimland, H. Weman, Nano Lett., 18, 2304 (2018). DOI: 10.1021/acs.nanolett.7b05015
  6. D. Alcer, M. Tirrito, L. Hrachowina, M.T. Borgstrom, ACS Appl. Nano Mater., 7, 2352 (2024). DOI: 10.1021/acsanm.3c05909
  7. K.A. Dick, J. Bolinsson, B.M. Borg, J. Johansson, Nano Lett., 12, 3200 (2012). DOI: 10.1021/nl301185x
  8. V. Zannier, D. Ercolani, U.P. Gomes, J. David, M. Gemmi, V.G. Dubrovskii, L. Sorba, Nano Lett., 16, 7183 (2016). DOI: 10.1021/acs.nanolett.6b03524
  9. G. Priante, G. Patriarche, F. Oehler, F. Glas, J.-C. Harmand, Nano Lett., 15, 6036 (2015). DOI: 10.1021/acs.nanolett.5b02224
  10. D. Scarpellini, C. Somaschini, A. Fedorov, S. Bietti, C. Frigeri, V. Grillo, L. Esposito, M. Salvalaglio, A. Marzegalli, F. Montalenti, E. Bonera, P.G. Medaglia, S. Sanguinetti, Nano Lett., 15, 3677 (2015). DOI: 10.1021/nl504690r
  11. M. Marnauza, R. Sjokvist, A. Kraina, D. Jacobsson, K.A. Dick, ACS Nanosci. Au, 5, 208 (2025). DOI: 10.1021/acsnanoscienceau.5c00015
  12. E.D. Leshchenko, N.V. Sibirev, Nanomaterials, 14, 1816 (2024). DOI: 10.3390/nano14221816
  13. G. Priante, F. Glas, G. Patriarche, K. Pantzas, F. Oehler, J.-C. Harmand, Nano Lett., 16, 1917 (2016). DOI: 10.1021/acs.nanolett.5b05121
  14. V.G. Dubrovskii, A.A. Koryakin, N.V. Sibirev, Mater. Des., 132, 400 (2017). DOI: 10.1016/j.matdes.2017.07.012
  15. E.D. Leshchenko, V.G. Dubrovskii, Nanotechnology, 34, 065602 (2023). DOI: 10.1088/1361-6528/aca1c9
  16. V.G. Dubrovskii, N.V. Sibirev, Cryst. Growth Des., 16, 2019 (2016). DOI: 10.1021/acs.cgd.5b01613
  17. V.G. Dubrovskii, Nanomaterials, 14, 821 (2024). DOI: 10.3390/nano14100821
  18. S.G. Ghalamestani, M. Ek, M. Ghasemi, P. Caroff, J. Johansson, K.A. Dick, Nanoscale, 6, 1086 (2014). DOI: 10.1039/c3nr05079c
  19. L. Li, L. Pan, Y. Xue, X. Wang, M. Lin, D. Su, Q. Zhang, X. Yu, H. So, D. Wei, B. Sun, P. Tan, A. Pan, J. Zhao, Nano Lett., 17, 622 (2017). DOI: 10.1021/acs.nanolett.6b03326
  20. M. Borg, K.A. Dick, J. Eymery, L.-E. Wernersson, Appl. Phys. Lett., 98, 113104 (2011). DOI: 10.1063/1.3566980
  21. S.G. Ghalamestani, M. Ek, M. Ghasemi, B. Ganjipour, C. Thelander, J. Johansson, P. Caroff, K.A. Dick, Nano Lett., 12, 4914 (2012). DOI: 10.1021/nl302497r
  22. V. Zannier, F. Rossi, V.G. Dubrovskii, D. Ercolani, S. Battiato, L. Sorba, Nano Lett., 18, 167 (2018). DOI: 10.1021/acs.nanolett.7b03742
  23. R.S. Wagner, W.C. Ellis, Appl. Phys. Lett., 4, 89 (1964). DOI: 10.1063/1.1753975
  24. P. Caroff, M.E. Messing, M. Borg, K.A. Dick, K. Deppert, L.E. Wernersson, Nanotechnology, 20, 495606 (2009). DOI: 10.1088/0957-4484/20/49/495606
  25. F. Jabeen, S. Rubini, F. Martelli, Microelectronics J., 40, 442 (2009). DOI: 10.1016/j.mejo.2008.06.001
  26. P. Krogstrup, R. Popovitz-Biro, E. Johnson, M.H. Madsen, J. Nygard, H. Shtrikman, Nano Lett., 10, 4475 (2010). DOI: 10.1021/nl102308k
  27. F. Glas, M.R. Ramdani, G. Patriarche, J.-C. Harmand, Phys. Rev. B, 88, 195304 (2013). DOI: 10.1103/PhysRevB.88.195304
  28. V.G. Dubrovskii, T. Xu, A. Diaz Alvarez, S.R. Plissard, P. Caroff, F. Glas, B. Grandidier, Nano Lett., 15, 5580 (2015). DOI: 10.1021/acs.nanolett.5b02226
Publisher:

Ioffe Institute

Institute Officers:

Director: Sergei V. Ivanov

Contact us:

26 Polytekhnicheskaya, Saint Petersburg 194021, Russian Federation
Fax: +7 (812) 297 1017
Phone: +7 (812) 297 2245
E-mail: post@mail.ioffe.ru