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Depth profiling of multilayer inhomogeneous ultra-thin films with a sub-nanometer resolution
Russian version
Lubenchenko A. V. 1, Lubenchenko O. I.1, Ivanov D. A. 1, Lukyantsev D. S. 1, Pavolotsky A. B. 2, Pavolotsky A. B. 1, Ivanova I.V.1
1National Research University "MPEI", Moscow, Russia
2Chalmers University of Technology, Goteborg, Sweden
Email: lubenchenkoav@mpei.ru, IvanovaOlI@mpei.ru, IvanovDA@mpei.ru, LukyantsevDS@mpei.ru, alexey.pavolotsky@chalmers.se, pavlovthin@yandex.ru, IvanovaIV@mpei.ru
PDF
A comprehensive in situ method of non-destructive quantitative chemical phase depth profiling of multilayer multicomponent ultra-thin films on various substrates is proposed, within sub-nanometer accuracy, for depth up to few tens nanometers, based on angle-resolved X-ray photoelectron spectroscopy and photoelectron energy losses spectroscopy. Chemical phase depth profiling of air-oxidized ultra-thin niobium and niobium nitride films has been performed. Keywords: X-ray photoelectron spectroscopy, chemical and phase depth profiling, XPS background subtraction, XPS line decomposition.
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