An investigation of the diode properties of a double layer of a combined gas discharge
Brzhozovskii B. M. 1, Brovkova M. B.1, Gestrin S. G.1, Zinina E. P.1, Martynov V. V. 1
1Blagonravov Institute of Machine Science, Russian Academy of Sciences, Moscow, Russia
Email: bmbsar85@mail.ru, bmbsar@mail.ru, gestrin.s@yandex.ru, e-zinina@bk.ru, v_martynov@mail.ru

PDF
The paper shows that upon ignition of the combined gas discharge in the resonator chamber, there appears a double layer with diode properties that consists of layers of positive and negative charges surrounding the workpiece. An increase in the level of microwave power supplied to the chamber leads to a decrease in the equivalent diode resistance in open and closed modes and an increase in the current flowing through the unit. The ions of the process gas (nitrogen or argon) ionized by the microwave field fall on the product surface and diffuse into it as a result of the thermal diffusion process, which hardens the surface layer. The product is heated when a positive bias potential is applied to it by a stream of high-energy electrons arriving at the surface and accelerated to energies of tens and hundreds eV in the discharge acceleration zone. Ion-plasma implantation leads to a significant increase in the strength, wear resistance and corrosion resistance of the surface of the processed product. Keywords: microwave gas discharge, diode effect, layered structure of the discharge, hardening of the surface layer of metal products, ion-plasma diffusion implantation, current-voltage characteristics, processing unit equivalent circuit. DOI: 10.21883/0000000000
  1. V.K. Sheleg, A.N. Zhigalov, D.D. Bogdan. Nauka i tekhnik, 19 (4), 271, (2020). (in Russian)
  2. S. Hussain, X. Yang, M.K. Aslam, A. Shaheen, M.S. Javed, N. Aslam, B. Aslam, G. Liu, G. Qiao. Chem. Engineer. J., 391, 123595 (2020)
  3. L. Luis, J. Andrade, C.M. Pesqueira, I. Siqueira, G.B. Sucharski, M.J. de Sousa. J. Thermal Spray Technol., 30, 205 (2021). DOI: 10.1007/s11666-021-01152-8
  4. A. Mosavi, F. Salehi, L. Nadai, S. Karoly, N.E. Gorji. Results in Physics, 16, 102883 (2020). DOI: 10.1016/j.rinp.2019.102883
  5. V.E. Gromov, Yu.F. Ivanov, S.V. Konovalov, Yu. Feng, D.A. Kosinov. Vestnik MGTU im. G.I. Nosova, 14 (2), 69 (2016). (in Russian)
  6. S.N. Grigoriev, A.S. Metel, T.V. Tarasova, A.A. Filatova, S.K. Sundukov, M.A. Volosova, A.A. Okunkova, Yu.A. Melnik, P.A. Podrabinnik. Metals, 10 (11), 1540 (2020)
  7. V.A. Aleksandrov, L.G. Petrova, A.S. Sergeeva, V.D. Aleksandrov, E.U. Akhmetzhanova. Russ. Engineer. Res., 39 (8), 693 (2019)
  8. N.V. Gavrilov, A.S. Mamaev, A.V. Chukin. Poverkhnost'. Rentgenovskie, sinkhrotronnye i nejtronnye issledovaniya, 11, 61 (2017). (in Russian)
  9. S. Grigoriev, A. Metel, M. Volosova, Y. Melnik, H.A. Ney, E. Mustafaev. Technologies, 7 (3), 62 (2019). DOI: 10.3390/technologies7030062
  10. M. Ueda, C. Silva, B. Gelson, L. Pichon, H. Reuther. J. Vacuum Sci. Technol. B, 37, 042902 (2019). DOI: 10.1116/1.5092435
  11. L. Luiz, B.C.E.S. Kurelo, G.B. de Souza, J. de Andrade, C.E.B. Marino. Mater. Today Commun., 28, 102655 (2021). DOI: 10.1016/j.mtcomm.2021.102655
  12. B. Yang, Q. Shen, Z. Gan, S. Liu. Cryst. Eng. Comm., 21, 6574 (2019)
  13. K.F. Sergeychev, N.A.Lukina, N.R. Arutyunyan. Fizika plazmy, 45 (6), 513 (2019) (in Russian)
  14. K.F. Sergejchev. Uspekhi prikladnoi fiziki, 3 (4), 342 (2015). (in Russian)
  15. N.V. Gavrilov, A.S. Mamaev, A.V. Chukin, J. Surf. Invest., 11, 1167 (2017)
  16. V.A. Shabashov, N.V. Gavrilov, K.A. Kozlov, A.V. Makarova, S.G. Titova, V.I. Voronin. Fizika metallov i metallovedenie, 119 (8), 802 (2018). (in Russian)
  17. V.A. Burdovitsin, D.A. Golosov, E.M. Oks, A.V. Tyunkov, Y.G. Yushkov, D.B. Zolotukhin, S.M. Zavadsky, Surf. Coat. Technol., 358, 726 (2019)
  18. N.N. Koval, A.I. Ryabchikov, D.O. Sivin, I.V. Lopatin, O.V. Krysina, Y.H. Akhmadeev, D.Y. Ignatov, Surf. Coat. Technol., 340, 152 (2018)
  19. T. Moskalioviene, A. Galdikas. Surf. Coatings Technol., 366, 277 (2019)
  20. A.S. Metel, S.N. Grigoriev, M.A. Volosova, Yu.A. Melnik, E.S. Mustafaev. Instruments and Experimental Techniques, 65 (6), 910 (2022)
  21. W. De Oliveira, B. Kurelo, D. Ditzel, F. Serbena, C. Foerster, G. de Souza. Appl. Surf. Sci., 434, 1161 (2018)
  22. K. Norrman, Y. Wang, E. Stamate, W. Zhang. Heliyon, 5, e01943 (2019).
  23. W.R. de Oliveira, A.R. Mayer, G.B. de Sousa, H.D. Carvajal Fals, A.G.M. Pukasiewicz. J. Thermal Spray Technol., 32, 737 (2023)
  24. V.P. Budaev, S.D. Fedorovich, A.V. Lubenchenko, A.V. Karpov, N.E. Belova, M.K. Gubkin. Heliyon, 6, e05510 (2020)
  25. M.S. Stechyshyn, A.V. Martynyuk, Y.M. Bilyk, V.P. Oleksandrenko, N.M. Stechyshyna. Mater. Sci., 53, 343 (2017)
  26. B. Brzhozovskii, M. Brovkova, S. Gestrin, V. Martynov, E. Zinina. J. Phys. D: Appl. Phys., 51, 145204 (2018)
  27. B. Brzhozovskii, M. Brovkova, S. Gestrin, V. Martynov, E. Zinina J. Phys. D: Appl. Phys., 52, 485202 (2019)
  28. B.M. Brzhozovsky, S.G. Gestrin, E.P. Zinina, V.V. Martynov. ZhTF, 87 (12), 1857 (2017). (in Russian)
  29. B. Brzhozovskii, M. Brovkova, S. Gestrin, E. Zinina, V. Martynov. Heliyon, 7, e07006 (2021)
  30. X. Deng, Y. Takaoka, H. Kousaka, N. Umehara. Surf. Coating. Technol., 238, 80 (2014)
  31. L.J. Zhu, Z.Q. Chen, Z.X. Yin, G.D. Wang, G.Q. Xia, Y.L. Hu, X.L. Zheng, M.R. Zhou, M. Chen, M.H. Liu. Chinese Phys. Lett., 31, 035203 (2014)
  32. Ya.I. Londer, K.N. Ulyanov. High Temp., 51 (1), 7 (2013)
  33. Ya.I. Londer, K.N. Ulyanov. High Temp., 52 (6), 787 (2014)
  34. U.P. Raizer. UFN, 132 (3), 549 (1980) (in Russian)
  35. V.I. Farenik. Phys. Surf. Eng., 2 (1), 117 (2004)
  36. E.M. Lifshitz, L.P. Pitaevskiy. Teoreticheskaya fizika. X. Fizicheskaya kinetika (Nauka, M., 1979) (in Russian)
  37. N.V. Gavrilov, A.I. Menshakov. Pribory i tekhnika eksperimenta 5, 140 (2011).(in Russian)
  38. A.K. Rebrov, M.V. Isupov, A.Yu. Litvintsev, V.F. Burov. Prikladnaya mekhanika i tekhnicheskaya fisika, 59 (5), 5 (2018). (in Russian)
  39. A. Popovich, M. Shevchenko, S. Savin, E. Zavedeev, M. Zanaveskin, A. Sinogeykin, V. Ralchenko, V. Konov. Coatings, 10 (10), 939 (2020). DOI: 10.3390/coatings10100939
  40. K. An, S.W. Yu, X.J. Li, Y.Y. Shen, B. Zhou, G.J. Zhang, X.P. Liu. Vacuum, 117, 112 (2015). DOI: 10.1063/6.0000846
  41. C.J. Widmann, W. Muller-Sebert, N. Lang, C.E. Nebel. Diamond Related Mater., 64, 1 (2016)
  42. J. Weng, F. Liu, L.W. Xiong., J.H. Wang, Q. Sun. Vacuum, 147, 134 (2018).
Publisher:

Ioffe Institute

Institute Officers:

Director: Sergei V. Ivanov

Contact us:

26 Polytekhnicheskaya, Saint Petersburg 194021, Russian Federation
Fax: +7 (812) 297 1017
Phone: +7 (812) 297 2245
E-mail: post@mail.ioffe.ru