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Using scanning probe lithography to form planar microparticles with configuration anisotropy
Bizyaev D.A.
1, Bukharaev A.A.
1, Morozova A. S.
1, Nurgazizov N.I.
1, Chuklanov А.P.
1
1Zavoisky Physical-Technical Institute, FRC Kazan Scientific Center of RAS, Kazan, Russia
Email: dbiziaev@inbox.ru, a_bukharaev@mail.ru, morozova_anna_s@mail.ru, niazn@mail.ru, a.chuklanov@gmail.com
The experimental results of the formation of polymer masks for the creation of planar microparticles of a given shape by scanning probe lithography are presented. The problems associated with the nonlinearity of the probe movement during the mask formation are considered. The possibility of increasing the lifetime of the probe by changing the mask formation procedure and (or) changing the sample temperature has been demonstrated. Improving the quality of the resulting mask is achieved through the use of chemical etching. Keywords: Atomic force microscopy, polymer masks, chemical etching. DOI: 10.61011/TP.2023.07.56626.56-23
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