Technical Physics
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In situ probe measurements of plasma parameters during the deposition of boron coatings by the magnetron method
Gushenets V.I.1, Bugaev A.S.1, Vizir A.V.1, Oks E.M.1,2, Nikolaev A.G.1, Yushkov G.Yu.1
1Institute of High Current Electronics, Siberian Branch, Russian Academy of Sciences, Tomsk, Russia
2Tomsk State University of Control Systems and Radioelectronics, Tomsk, Russia
2Tomsk State University of Control Systems and Radioelectronics, Tomsk, Russia
Email: gvi@opee.hcei.tsc.ru, bugaev@opee.hcei.tsc.ru, vizir@opee.hcei.tsc.ru, oks@opee.hcei.tsc.ru, nik@opee.hcei.tsc.ru, gyushkov@mail.ru
The features of the probe technique are described and the results of measuring the parameters of plasma generated by a planar magnetron sputtering system with a pure boron target during coating deposition are presented. A feature of probe measurements was the use of heating the collecting surface of a single Langmuir probe. Heating led to a decrease in the electrical resistance of the boron film on the surface, which made it possible to carry out in situ probe measurements of the magnetron discharge plasma parameters during the entire process of boron coating. Keywords: plasma parameters, probe method, planar magnetron, boron films.
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