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Ion-plasma deposition of multicomponent films with a given law of composition distribution by thickness
Kozyrev A. B.
1, Volpyas V. A.
1, Tumarkin A. V.
1, Altynnikov A.G.
1, Komlev А. Е.
1, Platonov R. A.
1, Trofimov P M.1
1St. Petersburg State Electrotechnical University “LETI", St. Petersburg, Russia
Email: mlpeltech@gmail.com, Volpyas@yandex.ru, avtumarkin@yandex.ru, a.altynnikov@gmail.com, a.e.komlev@gmail.com, r.a.platonov@gmail.com, pavelmtrofimov@gmail.com
A method is proposed for ion-plasma deposition of thin multicomponent films with the ability to control the component composition in thickness (graded film) with a change in the pressure of the working gas according to a given law. Using the BaxSr1-xTiO3 (BSTO)perovskite-type structure as an example, the calculated (Monte Carlo simulation) and experimental dependences of the component composition of films and their deposition rate on the pressure of the working gas were obtained. As an example, the possibility of deposition of BSTO films with a linear distribution of composition by their thickness. Keywords: ion-plasma deposition, thin multicomponent films, composition control.
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