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Home » Technical Physics » Year 2022, issue 8 » Article p. 1023
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Prospective wavelengths for projection lithography uing synchrotron radiation
Russian version
DOI: 10.21883/TP.2022.08.54567.102-22
N. I. Chkhalo1, V. N. Polkovnikov1, N.N. Salashchenko1, R.A. Shaposhnikov1
1Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhny Novgorod, Russia
Email: chkhalo@ipmras.ru
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Promising wavelengths for next-generation lithography with a wavelength shorter than 13.5 nm based on a synchrotron X-ray source are discussed. Theoretical and experimental values of the reflection coefficients of multilayer X-ray mirrors providing the maximum reflectivity in the range of 11.4-3.1 nm are presented. The theoretical efficiency of multilayer optics is compared for different wavelengths. Keywords: X-ray lithography, multilayer X-ray optics, multilayer X-ray mirrors.
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