Thin film Al targets for a laser-plasma source of extreme ultraviolet radiation
Garakhin S.A.1, Lopatin A.Ya.1, Nachay A.N.1, Perekalov A.A.1, Pestov A.E.1, Salashchenko N.N.1, Tsybin N.N.1, Chkhalo N.I.1
1Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhny Novgorod, Russia
Email: lopatin@ipm.sci-nnov.ru
Using a multilayer mirror spectrometer of the extreme ultraviolet (EUV) range, the laser plasma emission spectra of bulk aluminum in the wavelength range of 8.0-18.0 nm were studied. Testing of thin film laser targets made of aluminum and comparative measurements of the intensity of EUV radiation of a film with a thickness of 100 nm and a bulk material target were carried out. Keywords: SXR and EUV radiation, thin film, laser plasma.
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