Technical Physics
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Thin film Al targets for a laser-plasma source of extreme ultraviolet radiation
Using a multilayer mirror spectrometer of the extreme ultraviolet (EUV) range, the laser plasma emission spectra of bulk aluminum in the wavelength range of 8.0-18.0 nm were studied. Testing of thin film laser targets made of aluminum and comparative measurements of the intensity of EUV radiation of a film with a thickness of 100 nm and a bulk material target were carried out. Keywords: SXR and EUV radiation, thin film, laser plasma.
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