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Dependence of the Sputtering Yield on the Angle of Ion Incidence on the Target Surface
We investigated the behavior of sputtering yield for oblique angles of ion incidence on the target surface. The range of incidence angles varied from 0o (normal incidence) to almost 90o (limiting grazing incidence). Computer simulation was performed by the program PAOLA. Theoretical analysis included numerical solution of the Chandrasekhar integral equation. The results obtained are compared with the results of other authors Keywords: sputtering under ion bombardment, oblique ion incidence, sputtering yield, computer simulation, theoretical analysis.
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