Technical Physics Letters
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Production of coating based on high-entropy carbide in the arc discharge plasma
Nikitin D. S.
1, Shanenkov I. I.1, Nassyrbayev A.1, Sivkov A. A.1, Kvashnin A. G.2, Pak A. Ya.1
1Tomsk Polytechnic University, Tomsk, Russia
2Skolkovo Institute of Science and Technology, Moscow, Russia
2Skolkovo Institute of Science and Technology, Moscow, Russia
Email: nikitindmsr@yandex.ru
A coating based on high-entropy carbide was synthesized by using a coaxial magnetoplasma accelerator for generating a high-speed arc discharge plasma. The plasma was used to deposit the coating on a copper substrate under appropriate conditions. In the process of the plasma-dynamic synthesis, a stable high-entropy impurity-free compound TiZrNbHfTaC5 with the cubic Fm3m structure was formed. This compound has a sufficiently dense and uniform structure (with the porosity of ~7 %) ~ 20 μm thick. The resulting coating exhibits increased physical and mechanical characteristics including nanohardness of ~32 GPa and Young's modulus of ~303 GPa. These values make the material promising for producing hardened, wear-resistant and heat-protective products. Keywords: plasma, arc discharge, high-entropy carbide, coating.
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