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Fabrication of a blazed diffraction grating with variable line space
Mokhov D.V.
1,2, Berezovskaya T.N.
1, Shubina K.Yu.
1, Pirogov E.V.
1, Prasolov N.D.
3, Goray L.I.
1,2,4,5, Bouravleuv A.D.
2,3,4
1Alferov University, Saint Petersburg, Russia
2St. Petersburg Electrotechnical University ”LETI“, St. Petersburg, Russia
3Ioffe Institute, St. Petersburg, Russia
4Institute for Analytical Instrumentation of the Russian Academy of Sciences, Saint Petersburg, Russia
5Institute of Space Research, Russian Academy of Sciences, Moscow, Russia
2St. Petersburg Electrotechnical University ”LETI“, St. Petersburg, Russia
3Ioffe Institute, St. Petersburg, Russia
4Institute for Analytical Instrumentation of the Russian Academy of Sciences, Saint Petersburg, Russia
5Institute of Space Research, Russian Academy of Sciences, Moscow, Russia
Email: dm_mokhov@rambler.ru, bertana@spbau.ru, kshubina@spbau.ru, zzzavr@gmail.com, nikpras@mail.ioffe.ru, lig@pcgrate.com, bour@mail.ioffe.ru
Variable line spacing (VLS) blazed gratings were fabricated on silicon substrates using direct laser lithography and anisotropic wet etching. The grating parameters were monitored during fabrication using scanning electron microscopy and atomic force microscopy. The paper reports on the fabrication details and characteristics of VLS-grating prototypes with different blaze angles for a solar-blind UV polychromator. Keywords: Si diffraction grating, variable line spacing grating, blaze angle, triangle line profile, atomic force microscopy, scanning electron microscopy, UV.
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