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Stand for testing extreme ultraviolet sensitive photoresists
Russian version
Lopatin A. Ya.1, Luchin V. I.1, Nechay A. N..1, Perekalov A. A.1, Pestov A. E.1, Reunov D. G.1, Chkhalo N. I.1
1 Institute for physics of microstructure RAS, Nizhny Novgorod, Russia
Email: lopatin@ipm.sci-nnov.ru, luchin@ipm.sci-nnov.ru, nechay@ipm.sci-nnov.ru, perekalov@ipm.sci-nnov.ru, aepestov@ipm.sci-nnov.ru, reunov@ipm.sci-nnov.ru, chkhalo@ipm.sci-nnov.ru
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An experimental stand for testing photoresists sensitive to extreme ultraviolet radiation is described. The stand is based on a laser-plasma source with a Nd : YAG-laser (pulse energy 0.8 J, pulse duration 5.2 ns, focal spot diameter 66 μm, peak intensity up to 3·1012 W/cm2) and a gas jet as a target, as well as a mirror monochromator (a replaceable multilayer X-ray mirror optimized for a selected wavelength). The setup is equipped with a set of mirrors and filters for exposing samples at wavelengths of 11.2, 13.9 and 30.4 nm. Kr, Ar and He are used as working gases, the ions of which Kr X, Ar VIII and He II have intense emission bands in the vicinity of the indicated wavelengths. The stand was tested with photoresist samples, the size and shape of the focal spot were determined, which was about 0.5x1.0 mm2. Keywords: multilayer x-ray mirrors, monochromator, collector, x-ray and extreme ultraviolet wavelength range, photoresist, EUV lithography.
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