Technical Physics Letters
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Analysis of the surface layer of the platinum film grown by the ion-plasma deposition method on Si (001) and MgO (001) substrates
Zinchenko S. P.
1,2, Shirokov V. B.
1,2, Pavlenko A. V.
1,2, Kiseleva L. I.1
1Federal Research Center Southern Scientific Center of the Russian Academy of Sciences, Rostov-on-Don, Russia
2Southern Federal University, Rostov-on-Don, Russia
2Southern Federal University, Rostov-on-Don, Russia
Email: zinch5050@mail.ru, shirokov-vb@rambler.ru, tolik_260686@mail.ru, kislinka@list.ru
Platinum films deposited by a method of ion-plasma (cathode) sputtering at a constant current on a (001) cut of single-crystal silicon and magnesium oxide substrates. The angular dependence of the reflection coefficients of the E and H optical modes of laser radiation with a wavelength of 632.8 nm was measured. It is shown that, within the measurement error, it is not enough to use the formulas for reflection with the optical parameters of platinum, and it is necessary to additionally introduce an effective anisotropic layer related to surface heterogeneity. Keywords: Ion-plasma sputtering, platinum film, relief surface, effective layer.
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