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Project of X-ray optical scheme of a lithograph with a transmissive dynamic mask and a synchrotron radiation source
The paper proposes an X-ray optical scheme of a lithograph with a transmissive dynamic mask and a synchrotron radiation source. The image of a dynamic mask in the form of holes of small diameter is transferred with a decrease to a plate with a resist using a Schwarzschild projection lens. The formation of a topological pattern will occur due to the coordinated operation of the system for scanning a plate with a resist and a microelectromechanical system of a transmissive type. Objectives with a reduction of 10 and 20 times for obtaining 10-20 nm images of 200 nm holes of the dynamic mask are considered. The scheme of illumination of the mask is calculated, which provides uniform illumination on a field of 10x 10 mm2. For the synchrotron Siberia-2 of the KISI on a bending magnet, the expected productivity of the lithograph will be up to 1/14 of a plate with a diameter of 100 mm per hour. Keywords: X-ray lithography, X-ray optics, multilayer mirror, synchrotron radiation, aberrations. DOI: 10.61011/TP.2023.07.56638.111-23
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Дата начала обработки статистических данных - 27 января 2016 г.