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Experimental study of the mechanism of relief formation in liquid photopolymerizing compositions
Russian version
Solovjev V.S.1, Raschepkina N.A.2, Yakunenkova D.M.3, Chalykh A.E.4
1National Research University of Electronic Technology, Zelenograd, Moscow, Russia
2Samara State Technical University, Samara, Russia
3Samara State Aerospace University, Samara, Russia
4Frumkin Institute of Physical Chemistry and Electrochemistry, Russian Academy of Sciences, Moscow, Russia
Email: solovjev@polly.phys.msu.ru
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A theoretical and experimental study of the mechanism of microrelief formation on layers of liquid photopolymerizing compositions was carried out. A direct experiment was carried out to prevent diffusion mass transfer during the post-exposure period. From the experiment it became clear that there is no diffusion of the liquid oligomer from dark to light zones during the post-exposure period. It is concluded that, due to the microheterogeneous mechanism of polymerization, the increase in relief during the post-exposure period is due to the swelling of polymer globules in their own remaining oligomer.. Keywords: liquid photopolymerizing compositions, microrelief, degree of conversion, microheterogeneous mechanism, radical polymerization.
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