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Study of the influence of pressure and electric field on the material emission and deposition rate of Al2O3 and ZrO2 in the process of pulsed laser deposition
Vasilyev M. I.1, Dudnik Yu. D.
1, Safronov A. A.
1, Shiryaev V. N.
1, Vasilieva O. B.
1
1Institute for Electrophysics and Electric Power, Russian Academy of Sciences, St. Petersburg, Russia
Email: milavas@mail.ru, julia_dudnik-s@mail.ru, 9932553@mail.ru
The deposition of coatings on steel substrates from thin alternating layers consisting of aluminum oxide and yttrium-stabilized zirconium oxide in a vacuum chamber in an oxygen atmosphere was studied using pulsed laser deposition using a KrF excimer laser with an emission wavelength of 248 nm. To increase the deposition rate of ablated particles, an electric field was applied between the substrate and the target during the processing. The effect of an electric field of different polarity on the deposition rate was studied at different oxygen pressures in the vacuum chamber. The spectral intensity of the plasma plume of atoms and ionized particles was measured during the processing in order to study the particle composition in the plasma plume. The evolution of plasma plume images at different oxygen pressures in the vacuum chamber was recorded and processed. Keywords: pulsed laser deposition, laser ablation, thin films, plasma plume, emission spectra.
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