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Optimization of technologies for manufacturing integrated photonics structures using positive electron resist AR-P 6200
Kiselevskiy V.A.1,2, Fetisenkova K. A.2,3, Tatarintsev A.A.
2, Melnikov A. E.2, Glaz O. G.2,4
1 Institute of Ultra High Frequency Semiconductor Electronics of RAS, Moscow, Russia
2Valiev Institute of Physics and Technology of RAS, Moscow, Russia
3Moscow Institute of Physics and Technology, Dolgoprudny, Russia
4National Research University “MPEI”, Moscow, Russia
2Valiev Institute of Physics and Technology of RAS, Moscow, Russia
3Moscow Institute of Physics and Technology, Dolgoprudny, Russia
4National Research University “MPEI”, Moscow, Russia
Email: sevakiselevskiy@yandex.ru, alexen96@gmail.com, glaz@ftian.ru
A method for manufacturing waveguides with a channel of a given width using electron-beam lithography with the application of positive electron resist AR-P 6200 (CSAR 62) was developed. A technological process with selected parameters was found, which made it possible to manufacture test structures of integrated photonics. Keywords: fiber optics, electron beam lithography, reactive-ion etching, positive electron resist.
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