Physics of the Solid State
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Thin aluminum films deposited on liquid nitrogen cooled substrates
Strelkov M.1, Chekushkin A.1, Fominsky M.1, Kozulin R.1, Kraevsky S.2, Tatarintsev A.3, Zakharov D.3, Lomov A.3, Tarasov M.1
1Kotelnikov Institute of Radio Engineering and Electronics, Russian Academy of Sciences, Moscow, Russia
2V.N. Orekhovich Institute of Biomedical Chemistry, Moscow, Russia
3Valiev Institute of Physics and Technology of RAS, Moscow, Russia
Email: strelkov.mv@phystech.edu

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The microstructure of aluminum films thermally deposited on monocrystalline silicon substrates at liquid nitrogen temperature and at room temperature has been studied. The results of the study of the morphology and microstructure of the film by X-ray diffraction, atomic force and electron microscopy are presented. It is shown that the RMS roughness decreases from 0.4-1.2 to 0.19-0.34 nm when the substrate is cooled from room temperature to liquid nitrogen temperature. Keywords: thin films, surface morphology, film structure, superconductivity, SIS junction, crystal structure.
  1. S. Fritz, L. Radtke, R. Schneider, M. Weides, D. Gerthsen. J. Appl. Phys. 125, 16, 165301 (2019)
  2. M. Tarasov, A. Lomov, A. Chekushkin, M. Fominsky, D. Zakharov, A. Tatarintsev, S. Kraevsky, A. Shadrin. Nanomaterials 13, 2002 (2023). https://doi.org/10.3390/nano13132002
  3. D.A. Kalacheva. Sverkhprovodnikoviye ustroistva s nelineinoy kineticheskoy inductivnostiy na osnove gibridnykh structur is tonkikh plenok aluminia. Dis. k.f.-m.n. (2023). (in Russian)

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