Physics of the Solid State
Volumes and Issues
Electron Transport in Carbon-Based Nanocomposites for Memristor Nanosystems
Vedeneev A. S.1, Kozlov A. M.1, Kolodko D. V.1, Luzanov V. A.1, Sorokin I. A.1
1Kotelnikov Radio-Engineering and Electronics Institute of the Russian Academy of Sciences, Fryazino, Russia
Email: Valery@Luzanov.ru

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A technology has been developed for the synthesis of non-doped diamond-like carbon (DLC) and metal-containing carbon nanocomposites based on DLC doped with metal (Cu, Ni, Ti, Mo, W, Fe) for the manufacture of memristor memory elements. The structure of DLC and the features of electron transport in Pt|DLC|Pt and Pt|DLC : Ni|Pt systems with Ni content up to 40 at.% have been studied, and the percolation threshold has been determined. The nature and mechanisms of the nonlinearity of the current-voltage characteristics of the studied structures and further prospects for their application in memristor nanosystems are discussed. Keywords: diamond-like carbon, physicochemical synthesis, electromigration, hybridization, percolation, resistive switching, spin-relative transport, beam plasma.
  1. J.S. Lee, S. Lee, T.W. Noh. Appl. Phys. Rev. 2, 3, 031303 (2015)
  2. Resistive switching: from fundamentals of nanoionic redox processes to memristive device applications / Eds D. Ielmini, R. Waser. John Wiley \& Sons (2015)
  3. D. Ielmini. Semicond. Sci. Technol. 31, 6, 063002 (2016)
  4. D.H. Kwon, K.M. Kim, J.H. Jang, J.M. Jeon, M.H. Lee, G.H. Kim, X.-S. Li, G.-S. Park, B. Lee, S. Han, M. Kim, C.S. Hwang. Nature Nanotechnol. 5, 2, 148 (2010)
  5. M. Kyu Yang, H. Ju, G. Hwan Kim, J.-K. Lee, H.-C. Ryu. Sci. Reps. 5, 1, 14053 (2015)
  6. H. Jiang, L. Han, P. Lin, Z. Wang, M.H. Jang, Q. Wu, M. Barnell, J.J. Yang, H.L. Xin, Q. Xia. Sci. Reps 6, 1, 28525 (2016)
  7. A. Mehonic, A.L. Shluger, D. Gao, I. Valov, E. Miranda, D. Ielmini, A. Bricalli, E. Ambrosi, C. Li, J.J. Yang, Q. Xia, A.J. Kenyon. Adv. Mater. 30, 43, 1801187 (2018)
  8. J. Grollier, D. Querlioz, M.D. Stiles. Proceed. IEEE 104, 10, 2024 (2016)
  9. D.A. Lapkin, A.V. Emelyanov, V.A. Demin, V.V. Erokhin, L.A. Feigin, P.K. Kashkarov, M.V. Kovalchuk. Appl. Phys. Lett. 112, 4, 043302 (2018)
  10. A.S. Vedeneev, V.V. Rylkov, K.S. Napolskii, A.P. Leontiev, A.A. Klimenko, A.M. Kozlov, V.A. Luzanov, S.N. Nikolaev, M.P. Temiryazeva, A.S. Bugaev. JETP Lett. 106, 6, 411 (2017)
  11. U. Russo, D. Ielmini, C. Cagli, A.L. Lacaita. IEEE Trans. Electron. Devices 56, 2, 186 (2009)
  12. Y. Sharma, P. Misra, R.S. Katiyar. Appl. Phys. Lett. 116, 8, 084505 (2014)
  13. P. Peng, D. Xie, Y. Yang, Y. Zang, X. Gao, C. Zhou, T. Feng, H. Tian, T. Ren, X. Zhang. J. Appl. Phys. 111, 8, 084501 (2012)
  14. F. Zhuge, W. Dai, C.L. He, A.Y. Wang, Y.W. Liu, M. Li, Y.H. Wu, P. Cui, R.-W. Li. Appl. Phys. Lett. 96, 16, 163505 (2010)
  15. X. Liao, X. Zhang, K. Takai, T. Enoki. J. Appl. Phys. 107, 1, 013709 (2010)
  16. S. Takabayashi, M. Yang, S. Ogawa, H. Hayashi, R. Jevsko, T. Otsuji, Y. Takakuwa. J. Appl. Phys. 116, 9, 093507 (2014)
  17. V.A. Luzanov, A.S. Vedeneev. J. Commun. Technol. Electron. 63, 9, 1068 (2018)
  18. B.I. Shklovskii. Sov. Phys. Semicond.-USSR 13, 1, 53 (1979)
  19. J. Frenkel. Phys. Rev. 54, 8, 647 (1938)
  20. V.A. Levanov, A.V. Emel'yanov, V.A. Demin, K.E. Nikirui, A.V. Sitnikov, S.N. Nikolaev, A.S. Vedeneev, Yu.E. Kalinin, V.V. Ryl'kov. J. Commun. Technol. Electron. 63, 5, 491 (2018)
  21. N. Eimori, Y. Mori, A. Hatta, T.I.T. Ito, A.H.A. Hiraki. Jpn. J. Appl. Phys. 33, 11R, 6312 (1994)
  22. M.A. Lampert, R.B. Schilling. In: Semiconductors. Semimetals 6, 1--96, Elsevier (1970)
  23. N. Andreeva, A. Ivanov, A. Petrov. AIP Advances 8, 2, 025208 (2018)
  24. M. Pollak, J.J. Hauser. Phys. Rev. Lett. 31, 21, 1304 (1973)
  25. M.E. Ravi kh, I.M. Ruzin. Soviet JETP Lett. 43, 9, 562 (1986)
  26. B.A. Aronzon, D.Y. Kovalev, V.V. Ryl'kov. Semiconductors 39, 7, 811 (2005)
  27. A. Khurshudov, K. Kato, S. Daisuke. J. Vacuum Sci. Technol. A 14, 5, 2935 (1996)
  28. Q. Wei, R.J. Narayan, A.K. Sharma, J. Sankar, J. Narayan. J. Vacuum Sci. Technol. A 17, 6, 3406 (1999)
  29. H. Dimigen, C.-P. Klages. Surface. Coatings Technol. 49, 1--3, 543 (1991)
  30. X.M. He, M. Hakovirta, M. Nastasi. Mater. Lett. 59, 11, 1417 (2005)
  31. J.C. Damasceno, S.S. Camargo Jr, F.L. Freire Jr., R. Carius. Surface. Coatings Technol. 133-134, 247 (2000)
  32. R. Gampp, P. Gantenbein, Y. Kuster, P.P. Reimann, R. Steiner, P. Oelhafen, S. Brunold, U. Frei, A. Gombert, R. Joerger, W. Graf, M. Koehl. Proceed. Soc. Photo-Opt. Instrum. Eng. 2255, 1, 92 (1994)
  33. C. Donnet, J. Fontaine, A. Grill, V. Patel, C. Jahnes, M. Belin. Surface. Coatings Technol. 94-95, 531 (1997)
  34. M. Grischke, K. Bewilogua, K. Trojan, H. Dimigen. Surface. Coatings Technol. 74-75, 2, 739 (1995)
  35. Q. Wei, J. Sankar, J. Narayan. Surface. Coatings Technol. 146-147, 250 (2001)
  36. L.V. Lutsev, S.V. Yakovlev, V.I. Siklitskii. Phys. Solid State 42, 6, 1139 (2000)
  37. L.V. Lutsev, T.K. Zvonareva, V.M. Lebedev. Tech. Phys. Lett. 27, 8, 659 (2001)
  38. G.A. Nikolaichuk, S.V. Yakovlev, O.Y. Moroz, E.Y. Nakvasina. In: 13th Int. Conf. on Electromechanics, Electrotechnology, Electromaterials and Components (ICEEE). (2010). V. 4. P. 46-49
  39. G.A. Nikolaichuk, O.Y. Moroz, S.M. Dunaevskii. Tech. Phys. 63, 11, 1620 (2018)
  40. A.S. Vedeneev, V.A. Luzanov, V.V. Rylkov. JETP Lett. 109, 3, 171 (2019)
  41. S.N. Nikolaev, A.S. Vedeneev, V.A. Luzanov, A.V. Emel'yanov, A.M. Kozlov, A.S. Bugaev, V.V. Ryl'kov. J. Commun. Technol. Electron. 66, 10, 1196 (2021)
  42. A.S. Vedeneev, V.V. Ryl'kov, V.A. Luzanov, S.N. Nikolaev, A.M. Kozlov, A.S. Bugaev. J. Commun. Technol. Electron. 68, 8, 920 (2023)
  43. K.A. Nasyrov, V.A. Gritsenko. Phys. --- Usp. 56, 10, 999 (2013)
  44. S. Takabayashi, M. Yang, S. Ogawa, H. Hayashi, R. Jevsko, T. Otsuji, Y. Takakuwa. J. Appl. Phys. 116, 9, 093507 (2014)
  45. B.I. Shklovskii, A.L. Efros. Electronic Properties of Doped Semiconductors. Springer Science \& Business Media (2013). V. 45
  46. I.A. Sorokin, D.V. Kolodko, K.I. Krasnobaev. J. Commun. Technol. Electron. 65, 3, 286 (2020).

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