Kruchinin V.N.1, Spesivtsev E.V.1, Rykhlitsky S.V.1, Gritsenko V.A.1,2,3, Mehmood F.4, Mikolajick T.4,5, Schroeder U.4
1Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, Russia
2Novosibirsk State University, Novosibirsk, Russia
3Novosibirsk State Technical University, Novosibirsk, Russia
4NaMLab gGmbH, Dresden, Germany
5Chair of Nanoelectronics, TU Dresden, Dresden, Germany
Email: kruch@isp.nsc.ru, evs@isp.nsc.ru, rhl@isp.nsc.ru, grits@isp.nsc.ru, Furgan.Mehmood@namlab.com, Thomas.Mikolajick@namlab.com, Uwe.Schroeder@namlab.com
Recently ferroelectric properties have been found in hafnia-based nanosized films. Such films are of the utmost interest for development of a universal memory, which combines the advantages of random access memory and flash memory. The paper studies optical properties of hafnia-zirconium oxide films HfxZryO2 and lanthanum-alloyed hafnia-zirconium oxide films La : HfxZryO2. Fluctuations of thickness in HfxZryO2 do not exceed 3.5%, fluctuations of thickness in La : HfxZryO2 films - 3.2%. Optical properties are analyzed based on effective-medium theory. According to effective-medium theory data, HfxZryO2 films contain 46% HfO2, 54% ZrO2, La : HfxZryO2 films contain 47.5% HfO2, 52.4% ZrO2, 2.5% La2O3. Keywords: ferroelectric, refraction index, spectral ellipsometry, effective-medium theory.
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