Astankova K. N.
1, Kislukhin N. A.
2, Azarov I. A.
1,3, Prosvirin I. P.
4, Volodin V. A.
1,31Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, Russia
2Novosibirsk State Technical University, Novosibirsk, Russia
3Novosibirsk State University, Novosibirsk, Russia
4Boreskov Institute of Catalysis, Siberian Branch of RAS, Novosibirsk, Russia
Email: astankova-kn@isp.nsc.ru, nikitkis2002@gmail.com, azarov_ivan@mail.ru, prosvirin@catalysis.ru, volodin@isp.nsc.ru
The study object is thin films (~10-15 nm) of germanium monoxide obtained by thermal evaporation in vacuum of composite GeO2 layers containing Ge nanoclusters and deposition of GeO vapor on a cold substrate. Based on X-ray photoelectron spectroscopy data, it has been established that the short-range order structure of germanium monoxide films can be described by the random bonding model. The stoichiometric parameter x in GeOx films was 1.07±0.05. Raman spectroscopy and infrared spectroscopy data indicate different depths of the GeO disproportionation process during annealing from 5 to 30 minutes and a temperature of 200-400oC in vacuum. Annealing for 45 minutes or more at the same temperatures led to partial oxidation of amorphous Ge clusters in the oxide matrix. Keywords: germanium monoxide, germanium nanoclusters, random bonding model, disproportionation reaction, X-ray photoelectron spectroscopy, Raman spectroscopy, IR spectroscopy.
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