Physics of the Solid State
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Crystal structure, nanostructure, and dielectric characteristics of 0.91NaNbO3-0.09SrZrO3 films grown on a (001)SrTiO3(0.5% Nb) substrate
Matyash Ya. Yu.
1, Stryukov D. V.
1, Pavlenko A. V.
1,2, Ter-Oganessian N. V.
2
1Federal Research Center Southern Scientific Center of the Russian Academy of Sciences, Rostov-on-Don, Russia
2Southern Federal University, Research Institute of Physics, Rostov-on-Don, Russia
2Southern Federal University, Research Institute of Physics, Rostov-on-Don, Russia
Email: matyash.ya.yu@gmail.com, strdl@mail.ru, tolik_260686@mail.ru, teroganesyan@sfedu.ru
The structure, nanostructure, and properties of a 0.91NaNbO3-0.09SrZrO3 thin film with a thickness of ~30 nm, grown by RF cathode sputtering in an oxygen atmosphere on a (001)SrTiO3(0.5%Nb) substrate, have been studied. According to X-ray diffraction data, a significant tensile strain of the unit cell, which reaches 4.8%, occurs in the film in the direction perpendicular to the substrate. It is shown, that the likely film growth mechanism is the Frank-van der Merwe mechanism. The results of studying the dielectric hysteresis loops of the film in fields up to 833 kV/cm and its piezoactivity using atomic force microscopy indicated the presence of a ferroelectric response in it. Possible reasons for the identified features are discussed. Keywords: antiferroelectric, NaNbO3, SrZrO3, atomic force microscopy, X-ray diffraction, dielectric spectroscopy.
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