Physics of the Solid State
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- 2023
- 2022
Influence of oxygen on the process of formation of nanostructured films of indium-tin oxide
Aksenova V. V.1, Smirnova I. P.
1, Markov L. K.
1, Pavlyuchenko A. S.
1, Yagovkina M. A.
1
1Ioffe Institute, St. Petersburg, Russia
Email: valeriya11-12@mail.ru, irina@quantum.ioffe.ru, l.markov@mail.ioffe.ru, alexey.pavluchenko@gmail.com, ymasha@mail.ioffe.ru
In this work, the impact of oxygen presence in the working gas mixture on the formation of indium tin oxide films obtained by magnetron sputtering at high temperatures was studied. The addition of oxygen to the working mixture changes the film growth mechanism. The films grown in an oxygen-free plasma are an array of nanowires, while the films grown in an oxygen-containing medium have a weakly structured surface. According to the X-ray diffraction analysis, the films differ in preferential crystallographic orientation and its degree. The paper also compares the optical characteristics of the films under study. Keywords: nanostructured films, ITO, transparent conducting oxides, magnetron sputtering, X-ray phase analysis.
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