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Vacuum (gasless) magnetron discharge with a multicomponent sputtering cathode
Shandrikov M. V.
1, Oks E. M.
1, Cherkasov A. A.
1
1Institute of High Current Electronics, Siberian Branch, Russian Academy of Sciences, Tomsk, Russia
Email: shandrikov@hcei.ru
It has been shown that the range of cathode-target materials ensuring stable operation of a planar magnetron sputtering system in a vacuum (gasless) mode, without thermal evaporation or sublimation of the cathode material, can be significantly expanded through the use of multi-component targets. These targets include both metals with a relatively high sputtering yield (Cu, Zn, Pb, etc.) and those with a relatively low sputtering yield (Al, Ti, etc.), for which the vacuum mode is not achievable. Keywords: magnetron sputtering system, self-sputtering, vacuum (gasless) mode, multicomponent targets.
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