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Noise spectroscopy of current in ultraviolet LEDs based on InGaN/GaN quantum well structures
Ivanov A. M. 1, Klochkov A. V.1
1Ioffe Institute, St. Petersburg, Russia
Email: alexandr.ivanov@mail.ioffe.ru, alex.klo@mail.ioffe.ru

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The spectral density of low-frequency current noise increases sharply and changes its frequency dependence when the temperature drops below 150 K, in the flesh to the temperature of liquid nitrogen. Explanations are proposed based on changes in the mechanisms of carrier transport and the increasing role of nonradiative recombination. Keywords: low-frequency current noise, quantum wells, tunnel resistance.
  1. Z. Peng, W. Guo, T. Wu, Z. Guo, Y. Lu, Y. Zheng, Y. Lin, Z. Chen, IEEE Photon. J., 12 (1), 8200108 (2020). DOI: 10.1109/JPHOT.2019.2958311
  2. P. Tian, J.J.D. McKendry, J. Herrnsdorf, S. Watson, R. Ferreira, I.M. Watson, E. Gu, A.E. Kelly, M.D. Dawson, Appl. Phys. Lett., 105 (17), 171107 (2014). DOI: 10.1063/1.4900865
  3. S. Marcinkevicius, R. Yapparov, L.Y. Kuritzky, Y-R. Wu, S. Nakamura, J.S. Speck, Phys. Rev. B, 101, 075305 (2020). DOI: 10.1103/PhysRevB.101.075305
  4. D.S. Arteev, A.V. Sakharov, A.E. Nikolaev, W.V. Lundin, A.F. Tsatsulnikov, J. Lumin., 234, 117957 (2021). DOI: 10.1016/j.jlumin.2021.117957
  5. M.L. Lee, P.S. Hsieh, C.S. Chen, H.Z. Zhang, P.Y. Chen, C.Y. Yang, M.J. Wu, C.F. Lin, H.W. Hsu, M.Y. Kuo, H. Chen, J. Mater Sci.: Mater. Electron., 32, 28287 (2021). DOI: 10.1007/s10854-021-07205-6
  6. A.S. Pavluchenko, I.V. Rozhansky, D.A. Zakheim, Semiconductors, 43 (10), 1351 (2009). DOI: 10.1134/S1063782609100170
  7. L. Wan, X. Shao, Y. Ma, S. Deng, Y. Liu, J. Chen, Y. Gu, T. Li, X. Li, Infrared Phys. Technol., 109, 103389 (2020). DOI: 10.1016/j.infrared.2020.103389
  8. J. Glemvza, S. Pralgauskaite, V. Palenskis, J. Matukas, Lith. J. Phys., 59 (3), 146 (2019). DOI: 10.3952/physics.v59i3.4081
  9. B. Saulys, J. Matukas, V. Palenskis, S. Pralgauskaite, G. Kulikauskas, Acta Phys. Pol. A, 119 (4), 514 (2011). DOI: 10.12693/APhysPolA.119.514
  10. A.M. Ivanov, A.V. Klochkov, Semiconductors, 56 (6), 431 (2022). DOI: 10.21883/SC.2022.06.53546.9817
  11. A.M. Ivanov, G.V. Nenashev, A.N. Aleshin, J. Mater Sci.: Mater. Electron., 33, 21666 (2022). DOI: 10.1007/s10854-022-08955-7
  12. J. Glemvza, J. Matukas, S. Pralgauskaite, V. Palenskis, Lith. J. Phys., 58 (2), 194 (2018). DOI: 10.3952/physics.v58i2.3749
  13. A.M. Ivanov, A.V. Klochkov, J. Phys.: Conf. Ser., 2103, 012189 (2021). DOI: 10.1088/1742-6596/2103/1/012189
  14. N.I. Bochkareva, V.V. Voronenkov, R.I. Gorbunov, M.V. Virko, V.S. Kogotkov, A.A. Leonidov, P.N. Vorontsov-Velyaminov, I.A. Sheremet, Yu.G. Shreter, Semiconductors, 51 (9), 1186 (2017). DOI: 10.1134/S1063782617090068
  15. N.I. Solin, S.V. Naumov, Phys. Solid State, 45 (3), 486 (2003). DOI: 10.1134/1.1562235
  16. N.I. Bochkareva, Yu.T. Rebane, Yu.G. Shreter, Semiconductors, 49 (12), 1665 (2015). DOI: 10.1134/S1063782615120040
  17. J. Liu, W.S. Tam, H. Wong, V. Filip, Microelectron. Reliab., 49 (1), 38 (2009). DOI: 10.1016/j.microrel.2008.10.002
  18. Q. Lv, J. Gao, X. Tao, J. Zhang, C. Mo, X. Wang, C. Zheng, J. Liu, J. Lumin., 222, 117186 (2020). DOI: 10.1016/j.jlumin.2020.117186
  19. M. Buffolo, A. Caria, F. Piva, N. Roccato, C. Casu, C. De Santi, N. Trivellin, G. Meneghesso, E. Zanoni, M. Meneghini, Phys. Status Solidi A, 219, 2100727 (2022). DOI: 10.1002/pssa.202100727
  20. S. Pralgauskaite, V. Palenskis, J. Matukas, J. Glemvza, G. Muliuk, B. vSaulys, AA. Trink\=unas, Microelectron. Reliab., 55 (1), 52 (2015). DOI: 10.1016/j.microrel.2014.09.027

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