Influence of etching modes on the morphology and composition of the surface of multilayer porous silicon
Lenshin A. S.1,2, Peshkov Ya. A.1, Chernousova O. V.2, Barkov K. A.1, Kannykin S. V.1
1Voronezh State University, Voronezh, Russia
2Voronezh State University of Engineering Technologies, Voronezh, Russia
Email: lenshinas@mail.ru
Based on X-ray reflectometry and ultrasoft X-ray spectroscopy data, the opportunity of controlling surface porosity using multi-stage electrochemical etching modes is presented. It is presented how, with an increase in the porosity index of the near-surface layer, the morphology changes and the degree of oxidation of multilayer porous silicon samples increases. Keywords: porous silicon, X-ray reflectometry, porosity.
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