Growth of GaAs1-xBix layers by molecular-beam epitaxy
Semyagin B. R. 1, Kolesnikov A. V. 1, Putyato M. A. 1, Preobrazhenskii V. V. 1, Popova T. B.2, Ushanov V. I.2, Chaldyshev V. V. 2
1Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, Russia
2Ioffe Institute, St. Petersburg, Russia
Email: sbr@isp.nsc.ru, kolesn@isp.nsc.ru, puma@isp.nsc.ru, pvv@isp.nsc.ru, ushanovvi@mail.ioffe.ru, chald.gvg@mail.ioffe.ru

PDF
By molecular-beam epitaxy we have grown epitaxial layers of GaAs1-xBix solid solutions with a bismuth content of 0<x<0.02. Structural and optical properties of the layers were investigated. We determine the influence of the bismuth flux and substrate temperature on the bismuth incorporation into the growing layers. Keywords: gallium arsenide, bismuth, molecular-beam epitaxy, bandgap.
  1. V.V. Chaldyshev, S.V. Novikov. Isovalent impurity doping of direct-gap III-V semiconductor layers. In: Semiconductor Technology: Processing and Novel Fabrication Techniques, eds. M. Levinshtein and M. Shur (Wiley-Interscience, N.Y., USA, 1997)
  2. R.Kh. Akchurin, Yu.F. Biryulin, Le Din Cao, V.I. Fistul, V.V. Chaldyshev. Elektron. tekhn. Materialy, 11, 22 (1984) (in Russian)
  3. Yu.F. Biryulin, N.V. Ganina, V.V. Chaldyshev, Yu.V. Shmartsev. FTP, 19 (6), 1104 (1985) (in Russian)
  4. N.V. Ganina, V.B. Ufimtsev, V.I. Fistul. Pis'ma ZhTF, 8, 620 (1982) (in Russian)
  5. Yu.F. Biryulin, N.V. Ganina, V.V. Chaldyshev, Yu.V. Shmartsev. Pis'ma ZhTF, 12 (5), 274 (1986) (in Russian)
  6. Yu.F. Biryulin, L.V. Golubev, S.V. Novikov, V.V. Chaldyshev, Yu.V. Shmartsev. FTP, 21 (5), 949 (1987) (in Russian)
  7. Yu.F. Biryulin, V.V. Vorobieva, V.G. Golubev, L.V. Golubev, V.I. Ivanov-Omsky, S.V. Novikov, A.V. Osutin, I.G. Saveliev, V.V. Chaldyshev, Yu.V. Shmartsev, O.V. Yaroshevich. FTP, 21 (12), 2201 (1987) (in Russian)
  8. S. Tixier, M. Adamcyk, T. Tiedje, S. Francoeur, A. Mascarenhas, P. Wei, F. Schiettekatte. Appl. Phys. Lett., 82 (14), 2245 (2003)
  9. S. Francoeur, M.-J. Seong, A. Mascarenhas, S. Tixier, M. Adamcyk, T. Tiedje. Appl. Phys. Lett., 82 (22), 3874 (2003)
  10. E. Tisbi, E. Placidi, R. Magri, P. Prosposito, R. Francini, A. Zaganelli, S. Cecchi, E. Zallo, R. Calarco, E. Luna, J. Honolka, M. Vondravcek, S. Colonna, F. Arciprete. Phys. Rev. Appl., 14 (1), 014028 (2020)
  11. Yuchen Liu, Xin Yi, N.J. Bailey, Zhize Zhou, T.B.O. Rockett, Leh W. Lim, Chee H. Tan, R.D. Richards, J.P.R. David. Nature Commun., 12 (1), 4784 (2021)
  12. K. Bertulis, A. Krotkus, G. Aleksejenko, V. Pavcebutas, R. Adomavivcius, G. Molis, S. Marcinkevivcius. Appl. Phys. Lett., 88 (20), 201112 (2006)
  13. Sonia Blel, C. Bilel. J. Electron. Mater., 50 (6), 3380 (2021)
  14. S.T. Schaefer, M.S. Milosavljevic, R.R. Kosireddy, S.R. Johnson. J. Appl. Phys., 129 (3), 035303 (2021)
  15. Y. Guan, G. Luo, D. Morgan, S.E. Babcock, T.F. Kuech. J. Phys. Chem. Solids, 138, 109245 (2020)
  16. M.A. Stevens, K.A. Grossklaus, T.E. Vandervelde. J. Cryst. Growth, 527, 125216 (2019)
  17. C. Cornille, A. Arnoult, Q. Gravelier, C. Fontaine. J. Appl. Phys., 126 (9), 093106 (2019)
  18. M.A. Stevens, K.A. Grossklaus, J.H. McElearney, T.E. Vandervelde. J. Electron. Mater., 48 (5), 3376 (2019)
  19. J. Puustinen, J. Hilska, M. Guina. J. Cryst. Growth, 511, 33 (2019)
  20. P. van der Sluis. J. Phys. D: Appl. Phys., 26, A188 (1993)
  21. G.M. Martin. Appl. Phys. Lett., 39, 9 (1981)
  22. L.G. Lavrent'eva, M.D. Vilisova, V.V. Preobrazhenskii, V.V. Chaldyshev. Crystallography Reports, 47, S118 (2002)
  23. V.V. Chaldyshev. Mater. Sci. Eng. B, 88, 195 (2002)
  24. M.R. Melloch, J.M. Woodall, E.S. Harmon, N. Otsuka, F.H. Pollak, D.D. Nolte, R.M. Feenstra, M.A. Lutz. Annual Rev. Mater. Sci., 25, 547 (1995)
  25. A.R. Mohmad, F. Bastiman, J.S. Ng, S.J. Sweeney, J.P.R. David. Phys. Status Solidi C, 9 (2), 259 (2012)

Подсчитывается количество просмотров абстрактов ("html" на диаграммах) и полных версий статей ("pdf"). Просмотры с одинаковых IP-адресов засчитываются, если происходят с интервалом не менее 2-х часов.

Дата начала обработки статистических данных - 27 января 2016 г.

Publisher:

Ioffe Institute

Institute Officers:

Director: Sergei V. Ivanov

Contact us:

26 Polytekhnicheskaya, Saint Petersburg 194021, Russian Federation
Fax: +7 (812) 297 1017
Phone: +7 (812) 297 2245
E-mail: post@mail.ioffe.ru