ФТТ, 2004, том 46, выпуск 4

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Modification of physical properties of chemical vapor deposited nanostructure diamond by argon-hydrogen plasma surface treatment

Y.Hayashi, D.Mori, T.Soga, T.Jimbo

Department of Environmental Technology and Urban Planning, Nagoya Institute of Technology,
Nagoya 466-8555, Japan
E-mail: hayashi.yasuhiko@nitech.ac.jp

Nanostructure diamond (NSD) film with the hardness as high as 70 GPa and the average surface roughness of 10 nm has been synthesized by the two-step negative substrate bias method combined with post-growth Ar--H2 plasma irradiation. The Ar--H2 plasma irradiation has been confirmed to improve the uniformity of grain size and shape, and increase the hardness of the NSD film. This work was partly supported by the Research Foundation for the Electrotechnology of Chubu (REFEC), the Daiko Foundation and the NITECH 21st Century COE Program \glqq World Ceramics Center for Environmental Harmony\grqq.

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